Modeling of Plasma-enhanced Chemical Vapor Deposited Silicon Nitride Thin Films Into Confined Geometries
Download or Read eBook Modeling of Plasma-enhanced Chemical Vapor Deposited Silicon Nitride Thin Films Into Confined Geometries PDF written by Ronald James Spence and published by . This book was released on 1993 with total page 460 pages. Available in PDF, EPUB and Kindle.
Author | : Ronald James Spence |
Publisher | : |
Total Pages | : 460 |
Release | : 1993 |
ISBN-10 | : OCLC:31966663 |
ISBN-13 | : |
Rating | : 4/5 (63 Downloads) |
Book Synopsis Modeling of Plasma-enhanced Chemical Vapor Deposited Silicon Nitride Thin Films Into Confined Geometries by : Ronald James Spence
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