Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source
Download or Read eBook Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source PDF written by Giridhar Nallapati and published by . This book was released on 1999 with total page 108 pages. Available in PDF, EPUB and Kindle.
Author | : Giridhar Nallapati |
Publisher | : |
Total Pages | : 108 |
Release | : 1999 |
ISBN-10 | : OCLC:248523416 |
ISBN-13 | : |
Rating | : 4/5 (16 Downloads) |
Book Synopsis Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source by : Giridhar Nallapati
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