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Language: en
Pages: 464
Pages: 464
Type: BOOK - Published: 1989 - Publisher: William Andrew
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synt
Language: en
Pages: 664
Pages: 664
Type: BOOK - Published: 2011-06-28 - Publisher: Springer Science & Business Media
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication.
Language: en
Pages: 630
Pages: 630
Type: BOOK - Published: 2012-12-02 - Publisher: Newnes
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particul
Language: en
Pages: 947
Pages: 947
Type: BOOK - Published: 2014-09-19 - Publisher: Cambridge University Press
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposit
Language: en
Pages:
Pages:
Type: BOOK - Published: 2010-03-01 - Publisher: Materials Research Society
The Handbook of Modern Ion Beam Materials Analysis, 2nd Edition is a compilation of updated techniques and data for use in the ion-beam analysis of materials. T