Related Books
Language: en
Pages: 13
Pages: 13
Type: BOOK - Published: 1998 - Publisher:
Multilayer mirror coatings which reflect extreme ultraviolet (EUV) radiation are a key enabling technology for EUV lithography. Mo/Si multilayers with reflectan
Language: en
Pages:
Pages:
Type: BOOK - Published: 1999 - Publisher:
The synchrotron-based reflectometer at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley is an important metrology tool within the current Extreme U
Language: en
Pages:
Pages:
Type: BOOK - Published: 1999 - Publisher:
A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corr
Language: en
Pages:
Pages:
Type: BOOK - Published: 1999 - Publisher:
The performance of beryllium-based multilayer coatings designed to reflect light of wavelengths near 11 nm, at normal incidence, is presented. These multilayer
Language: en
Pages:
Pages:
Type: BOOK - Published: 2000 - Publisher:
A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer